Project Description
Experience
- Nano Thin Film Process Engineer, TSMC (20192021)
- Reduced concave defect by 84% in the silicon epitaxial growth process through patching the silicon substrate.
- Ramped up new process tool successfully within a month and controlled its quality under criteria of six sigma.
- Increased the productivity by recipe optimization and robot mechanical movement adjustment.
- Collaborated with process integration team for improving the device performance
Awards and Honors
- Best Master’s Academic Research, Aug. 2019
- Outstanding Scholastic Achievement, Aug. 2019
- The Best Innovative Team Award (The highest honor in Tsung-Hsien and Feng-Ying Innovative Process Design Contest), Jan. 2017
- Dean’s List (Spring 2017-Spring 2020)
- Presidential Award Recipient, Jan. 2017
Publications
- Kang, Y.S.; Ward, J.D.; Nagy, Z.K. A Hybrid Method for One-Dimensional Population Balance Modeling of Batch Thermo-cycling Crystallization. Computers & Chemical Engineering. 2021, 157, 107588
- Liao, T.J.; Kang, Y.S.; Lan, C.W. In-situ Observation of Crystal/melt Interface and Infrared Measurement of Temperature Profile during Directional Solidification of Silicon Plate. J. Crystal Growth. 2018, 499, 90-97
- Kang, Y.S.; Ward, J.D. Analysis of Seed Loading and Supersaturation Trajectories for Two-Dimensional Crystallization Systems. Ind. Eng. Chem. Res. 2017, 56, 10798−1081
Education
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